PH3601 Fabrication of Micro- and Nano-electronic Devices

Instructor: Lew Wen Siang
Office: SPMS-PAP-03-04
Phone: 6316 2963
Lecture/Tutorial hours : Semester 1 2018/2019 Wednesday 2.30-3.30 pm, Friday 10.30 am - 12.30pm
Lecture Venue: TR+1 (Wednesday and Friday)
Lab Demonstration: Wednesday 1.30-2.30 pm (Lab 01-01, Lab 05-12, Lab 01-08)

Course Objective:
This course aims to provide student a fundamental understanding of micro- and nano-electronic device fabrication. Students will learn techniques used in semiconductor device processing. The course prepares student for R&D and engineering manufacturing profession in microelectronics industry.

Reference Books:
“Fabrication Engineering at the Micro- and Nanoscale”, S A Campbell, OUP (2008).
“Silicon VLSI Technology”, J D Plummer et al., Prentice Hall (2000).
“Introduction to Microfabrication”, Sami Franssila, Wiley (2004).
“Fundamentals of Microfabrication and Nanotechnology”, M J Madou, 3rd ed CRC Press(2011).
“Handbook of Semiconductor Manufacturing Technology”, R Doering et al., CRC Press (2008).


Final Examination 60% Restricted open book
Term Test 1 10% Restricted open book
Term Test 2 10% Restricted open book
Assignment 20% Report + Presentation

Course outline:

Lecture 1 An Overview of Semiconductor Technology
Lecture 2 Contamination Control
Lecture 3 Semiconductor Wafer
Lecture 4 Optical Lithography
Lecture 5 Etching
Lecture 6 Advanced Lithography Techniques
Lecture 7 Impurity Doping
Lecture 8 Thermal Oxidation
Lecture 9 Vacuum Science and Technology
Lecture 10 Physical Vapour Deposition
Lecture 11 Chemical Vapour Deposition
Lecture 12 Metallisation
Lecture 13 Device Metrology
Lecture 14 Device Packaging
Lecture 15 Device Fabrication